Method of reducing cross contamination during manufacture of copper-contact and gold-contact gaas wafers using shared equipment

ABSTRACT

Systems, apparatuses, and methods related to the design, fabrication, and manufacture of gallium arsenide (GaAs) integrated circuits are disclosed. Copper can be used as the contact material for a GaAs integrated circuit. Metallization of the wafer and through-wafer vias can be achieved through copper plating processes disclosed herein. Various protocols can be employed during processing to avoid cross-contamination between copper-plated and non-copper-plated wafers. GaAs integrated circuits can be singulated, packaged, and incorporated into various electronic devices.

INCORPORATION BY REFERENCE TO ANY PRIORITY APPLICATIONS

Any and all applications for which a foreign or domestic priority claimis identified in the Application Data Sheet as filed with the presentapplication are hereby incorporated by reference under 37 CFR 1.57.

BACKGROUND OF THE INVENTION Field of the Invention

The present disclosure generally relates to the field of semiconductorwafer processing technology. In particular, this disclosure relates tothe design, fabrication, and manufacture of gallium arsenide (GaAs)integrated circuits.

Description of the Related Art

The use of GaAs substrates in the design and construction of integratedcircuits has proven to have desirable effects. For example, GaAssubstrates have been useful in achieving greater performance in poweramplifier circuits. Typically, a GaAs integrated circuit will be used asa component in a larger circuit device or design. In order to beintegrated into the circuit design, the GaAs integrated circuit ismechanically and electrically coupled to a printed circuit board for thecircuit device. In other cases, the GaAs integrated device is mounted toother electronic devices.

The contact side of the GaAs integrated circuit is typically adhered toa contact pad on the device's printed circuit board. More particularly,the integrated circuit usually includes a gold layer which adheres tothe printed circuit board pad using a conductive adhesive. Often, theGaAs substrate has vias which extend into or through the substrate forfacilitating electrical flow vertically through the substrate. Thesevias are also coated with the gold conductive material. Depositing thegold layer is a time-consuming and relatively inefficient process. Also,gold is an expensive material, increasing the cost for GaAs integratedcircuit products. Finally, gold has a relatively high dissolution ratein solder, and therefore is not able to be soldered to the pad of thedevice's printed circuit board. Instead, conductive adhesive istypically used to adhere the gold contact to the printed circuit board.The use of conductive adhesive requires an additional manufacturingstep, and also requires the use of larger pads to accommodate adhesiveoverflow. However, even with these undesirable features, gold continuesto be the standard metal used for a contact layer on GaAs integratedcircuits, which significantly drives up the product cost especially inrecent years due to the high price of gold.

Accordingly, there is a need for improved GaAs integrated circuits thatare employ less costly component materials more efficientlymanufactured. Furthermore, there is a need for improved methods formanufacturing such GaAs integrated circuits. As described herein, theinventors have developed systems and methods for fabricating GaAsintegrated circuits using copper as the material for the contact layer.Nonetheless, as many devices continue to use gold as the contactmaterial, there is often a need for use of shared equipment betweencopper-designated GaAs integrated circuits and gold-designated GaAsintegrated circuits. Due to the deleterious effects attributable tocross-contamination between the two different contact materials, thereis a need for improved systems and methods for processing GaAsintegrated circuits having various contact materials. In particular,there is a need for improved methods to prevent cross-contaminationbetween gold-designated GaAs integrated circuits and copper-designatedGaAs integrated circuits throughout processing.

SUMMARY OF THE INVENTION

Systems and methods for integrating the fabrication process of copperbackside GaAs integrated circuits into fabricating processes fortraditional GaAs integrated circuits with gold contact are disclosedherein. The systems and methods of numerous embodiments are designed forefficient use of shared equipment and tooling while reducingcross-contamination, copper oxidation, and other undesirable effects. Inone embodiment, a method of utilizing a single GaAs integrated circuitmanufacturing process line to produce integrated circuits with alternatebackside conductive material includes identifying one or more steps inthe manufacturing process which may cause cross contamination betweenprocessing integrated circuit products with a first backside material,such as gold, and alternately with a second backside material, such ascopper. The method further includes implementing one or more protocolsadapted to reduce cross-contamination for the identified steps.

In some embodiments, the one or more protocols include processing aplurality of wafer lots through a first series of steps using sharedequipment and tooling and identifying one or more of the wafer lotsdesignated for copper backside. The protocols further include separatingthe designated copper backside wafer lots from a remainder of the waferlots, processing the designated copper backside wafer lots through asecond series of steps, such as copper plating, using dedicatedequipment and tooling. The designated copper backside wafer lots can bemerged with the remainder of the wafer lots after the second series ofsteps. In some implementations, the designated copper backside waferlots and the remainder of the wafer lots are processed through a thirdseries of steps using shared equipment and tooling.

In some implementations, the designated copper backside wafer lots aremarked with an indicia that is different from corresponding indicia ofwafer lots configured to receive a backside other than copper. Theindicia can be desired lettering, such as a tag labeled COPPER. The tagmay be labeled with the word “copper” in the native language ofproduction personnel assigned to process the wafer lots. The indicia canalso include a color that is different from the color of thecorresponding indicia. In other implementations, the wafer designatedcopper backside wafer lots are placed in containers having a color thatis different from the color of containers used to hold the remainder ofthe wafer lots. In yet other implementations, production personnel arerequired to wear different color gloves when handling the designatedcopper backside wafer lots in the second series of steps. The color ofgloves worn by production personnel at the second series of steps arepreferably monitored and verified in some implementations.

According to another aspect of the invention, a method of manufacturinga GaAs integrated circuit including a copper backside includesidentifying a lot of GaAs wafers configured to receive a copperbackside, each of the wafers is mounted on a respective carrier. Themethod further includes depositing a desired thickness of copper on abackside of each of the GaAs wafers, forming a scribing street byremoving a portion of the copper from each of the GaAs wafers,depositing a protective layer of conductive material on the backside ofthe GaAs wafers, and debonding each of the GaAs wafers from therespective carrier. In some implementations, the lot of GaAs wafersconfigured to receive a copper backside is identified by being placed ina carrier having a color that is different from the color of carriersfor GaAs wafers configured to receive a backside other than copper. Inother implementations, the lot of GaAs wafers configured to receive acopper backside is identified prior to processing the wafers through aprocess that is susceptible to cross-contamination between copper andgold. In yet other implementations, the lot of GaAs wafers configured toreceive a copper backside is identified prior to processing the wafersthrough a process that induces copper oxidation.

Semiconductor integrated circuits can be made in accordance with thevarious methods disclosed herein.

For purposes of summarizing the disclosure, certain aspects, advantagesand novel features of the inventions have been described herein. It isto be understood that not necessarily all such advantages may beachieved in accordance with any particular embodiment of the invention.Thus, the invention may be embodied or carried out in a manner thatachieves or optimizes one advantage or group of advantages as taughtherein without necessarily achieving other advantages as may be taughtor suggested herein.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a block diagram representing an example of a sequence of waferprocessing for integrating copper aspects of embodiments of the presentinvention into fabrication processes in GaAs integrated circuitmanufacturing.

FIG. 2 shows a wafer carrier designated for both copper-contact andgold-contact GaAs wafers prior to metallization processes.

FIGS. 3A-3N show examples of structures at various stages of theprocessing sequence of FIG. 1.

FIG. 4 shows wafer carriers having identifying labels affixed thereto.

FIG. 5 is a partial block diagram of copper wafer processing directed tometal plating showing where certain protocols according to embodimentsof the present invention are implemented to prevent cross-contamination.

FIG. 6 is a partial block diagram of copper wafer processing directed tostreet formation showing where certain protocols according toembodiments of the present invention are implemented to preventcross-contamination.

FIG. 7 is a partial block diagram of copper wafer processing directed tocarrier debonding showing where certain protocols according toembodiments of the present invention are implemented to prevent crosscontamination.

FIG. 8 is a partial block diagram of copper wafer processing directed totesting showing where certain protocols according to embodiments of thepresent invention are implemented to prevent cross contamination.

FIGS. 9A-9D show an example sequence of singulating a GaAs integratedcircuit die from a wafer.

FIG. 10 shows an example sequence of ball grid array packaging ofsingulated GaAs integrated circuit dies, according to one embodiment.

FIGS. 11A-11H show examples of structures at various stages of theprocessing sequence of FIG. 10.

FIG. 12 illustrates a GaAs integrated circuit device made according tovarious methods of the present invention, mounted onto a printed circuitboard.

FIG. 13 illustrates an electronic device incorporating a GaAs integratedcircuit device made according to various methods of the presentinvention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT

The headings provided herein, if any, are for convenience only and donot necessarily affect the scope or meaning of the claimed invention.

Various embodiments of the present disclosure relate to novel systemsand methods for utilizing the same fabrication process line tomanufacture GaAs devices having different contact materials. Forexample, GaAs devices can be fabricated using gold as a metal contactlayer. The inventors have also developed methods and systems forfabricating GaAs devices using copper as a contact material. Copperprovides many advantages in GaAs integrated circuits over existing goldcontact material. However, since copper has not traditionally been usedin GaAs device manufacturing, its integration into existing GaAsfabrication process lines can present special problems and challengessuch as cross-contamination.

Copper contamination can deleteriously affect the functionality of GaAswafers with gold contact material. While establishing separate dedicatedequipment, or even separate facilities, for copper and gold processingmay avoid cross-contamination, such recourse is typicallycost-prohibitive. Accordingly, the inventors have developed a novelmethod of integrating copper backside plating processes into thetraditional gold plating GaAs fabrication line, which in someembodiments involves identifying certain equipment and/or tools that canbe shared between copper and gold processing, and others that cannot beshared. Generally, the method may also involve modifying fabricationsteps and establishing manufacturing protocols to reducecross-contamination, oxidation and other challenges associated withintegrating copper plating processes into existing gold fabricationlines. Particularly with respect to shared equipment, tools, andfabrication steps, proactive measures must be taken to reduce the riskof cross-contamination.

The inventors have developed process modifications and manufacturingprotocols specifically designed to effectively integrated processingcopper-contact GaAs circuits into existing fabrication lines forgold-contact GaAs circuits. In various embodiments of the presentdisclosure, GaAs wafers designated for either copper or gold contactscan be processed together in a single fabrication line with minimal riskof cross-contamination. FIG. 1 shows an example of a process 10according to one preferred embodiment in which copper contact platingprocesses are integrated into an existing gold GaAs integrated circuitfabrication line so that copper-contact and gold-contact GaAs circuitscan both be processed through the same fabrication line. As described ingreater detail below, the process 10 incorporates various controls andprotocols and is designed to allow copper-designated and gold-designatedGaAs wafers to be processed together in the same fabrication line withminimal cross-contamination.

FIG. 1 will now be described in greater detail. In the process 10 ofFIG. 1, a plurality of functional wafers can be provided (block 11). Thefunctional wafers can include wafers that are designated for either goldor copper contacts. The wafers can be all placed together in a waferrack in a manner as shown in FIG. 2 and labeled with the same lot number5. At this stage, there is no differentiation between wafers designatedfor copper contact versus gold contact. FIG. 3A depicts a side view ofsuch a wafer 30 having first and second sides. The first side can be afront side, and the second side a back side. FIG. 3B depicts an enlargedview of a portion 31 of the wafer 30. The wafer 30 can include a GaAssubstrate layer 32. The wafer 30 can further include a number offeatures formed on or in its front side. In the example shown, atransistor 33 and a metal pad 35 are depicted as being formed the frontside. The example transistor 33 is depicted as having an emitter 34 b,bases 34 a, 34 c, and a collector 34 d. Although not shown, thecircuitry can also include formed passive components such as inductors,capacitors, and source, gate and drain for incorporation of planar fieldeffect transistors (FETs) with heterojunction bipolar transistors(HBTs). Such structures can be formed by various processes performed onepitaxial layers that have been deposited on the substrate layer.

Referring to the process 10 of FIG. 1, the functional wafers of block 11can be tested (block 12) together in a number of ways prior to bonding.Such a pre-bonding test can include, for example, DC and RF testsassociated with process control parameters. Upon such testing, thewafers can be bonded to a carrier (block 13). In certainimplementations, such a bonding can be achieved with the carrier abovethe wafer. Thus, FIG. 3C shows an example assembly of the wafer 30 and acarrier 40 (above the wafer) that can result from the bonding step 13.Referring to the process 10 of FIG. 1, the wafer—now mounted to thecarrier plate—can be thinned so as to yield a desired substratethickness in blocks 14 and 15. Up through this step (block 13), there isno differentiation between wafers designated for copper-contact versusgold-contact.

Referring to the process 10 of FIG. 1, the thinned and stress-relievedwafers can undergo a through-wafer via formation process (block 16).FIGS. 3D-3E show different stages during the formation of a via 113.Such a via is described herein as being formed from the back side of thesubstrate 32 and extending through the substrate 32 so as to end at theexample metal pad 35. It will be understood that one or more featuresdescribed herein can also be implemented for other deep features thatmay not necessarily extend all the way through the substrate. Moreover,other features (whether or not they extend through the wafer) can beformed for purposes other than providing a pathway to a metal feature onthe front side.

Following through-wafer via formation (block 16), the GaAs wafers enterinto a metallization process (block 17) in which the vias are plated andmetal contacts are formed. Copper will be plated on GaAs wafersdesignated for copper-contact. Likewise, gold will be plated on GaAswafers designated for gold contact. As such, the process 10 incorporatescontrols and protocols set in place for this stage to substantiallyreduce the likelihood of cross-contamination between copper and gold.

Although copper has been used successfully in silicon wafer technology,to the best of the inventors' knowledge, copper has not beensuccessfully used in GaAs integrated circuit devices. A number ofobstacles have hindered the effective use of copper in metallization ofGaAs devices. For example, copper is an unintentional source ofimpurity, and is often proven to be the leading cause of GaAs devicefailures. Copper rapidly diffuses into GaAs substrates, at a rate fasterthan the diffusion of gold into GaAs substrates, and faster than thediffusion of copper into silicon substrates. Once copper diffuses intosource/gate/drain region of a field effect transistor (FET) or activeareas of a heterojunction bipolar transistor (HBT), the device willdegrade, and eventually fail electrically. Unlike gold, copper candiffuse into GaAs and create deep energy levels in the GaAs band gapregion. These deep levels will trap charges, which lead to degradationand failure of the GaAs devices.

To overcome the obstacles associated with effectively substitutingcopper for at least some of the gold in vias and back-side metal layersof GaAs integrated circuits, the inventors have developed modifiedprocesses, particularly for integrated copper through via metallizationinto a GaAs fabrication line which is normally configured for goldcontact plating. As illustrated in FIG. 1, the metal plating of vias(block 17) is shown expanded into several sub-processes. Similarly, thestreet formation step (block 18) is expanded into two sub-processes. Thesteps associated with blocks 11-16 of FIG. 1 can be common both towafers destined to receive a copper backside contact, and those thatwill later receive a gold backside contact. Accordingly, the tooling andequipment for these steps can be shared between the two different groupsor lots of wafers. In some embodiments, there may be no distinction atall up through the through-wafer via formation (block 16) step ofprocess 10. In other embodiments, the lots of wafers can be separatedand designated, and yet can use shared tooling, equipment and processesthrough the through-wafer via formation (block 16) of the process 10.

Following the through-wafer via formation (block 16), however, thegold-contact and copper-contact wafers are separately processed for themetal plating step (block 17). FIG. 4 shows two wafer racks, eachholding a plurality of GaAs wafers therein. The first wafer rack 1 isdesignated with the label “COPPER” while the second wafer rack 2 isdesignated with the label 6 reading “GOLD”. Accordingly, the GaAs wafers3 in the first wafer rack 1 are designated for processing with coppercontact material. The GaAs wafers 4 in the second wafer rack 2 aredesignated for processing with gold contact material. With theappropriate labeling in place, separate lots of wafers are processedindependently, although certain equipment and processes can be shared.As described in more detail herein, certain processing steps forcopper-designated wafers deviate from those for the gold-designatedwafers. In particular, processing steps between the two lots of wafersdeviate to reduce the risk of cross-contamination betweencopper-designated and gold-designated GaAs wafers. In addition tolabeling the lots separately, various other methods and procedures havebeen developed to reduce the risk of cross-contamination between the twolots at least partially sharing processing equipment

The metallization of the backside of the wafers and through-wafer vias(block 17) can be broken down into several sub-processes. FIG. 5 shows apartial block diagram illustrating the sub-processes of the metalplating of vias (block 17).

Up through the formation of through-wafer vias (block 16),copper-contact and gold-contact wafers can be processed using sharedequipment. However, to begin the metal plating of the vias (block 17),first the copper lot is identified (block 17 a). For example, aconspicuous sticker or tag labeled “COPPER” may be placed on all waferlots designated for copper plating, as shown in FIG. 4. In processing,those wafers designated for copper plating can be separated from thosewafers designated for gold plating. The copper-contact wafers are thenprocessed separately from the gold-contact wafers. The copper-contactwafers can be processed using tooling and equipment that are solelydedicated to processing of the copper-contact wafers, or in someinstances the equipment may be shared, although the two groups of waferswill be processed separately.

Once a wafer lot has been identified as designated for copper plating,the lot is subjected to a pre-clean step in block 17 b. FIG. 3F depictsthe formed via 113 processed through the pre-clean step 17 b. Thispre-clean step can, in various implementations, remove residues andother contamination from the via and back surface of the substrate. Thepre-clean step (block 17 b) can also activate the surfaces of the wafersfor subsequent metal adhesion. In some embodiments, the via may bepre-cleaned (block 17 b) using, for example HCl and/or an O₂ plasma ashprocess.

Following the pre-clean step (block 17 b), the copper lot can have ametal barrier and seed layer can be subsequently deposited in the viaand on the back surfaces of the substrates in block 17 c. FIG. 3G showsan example of a seed layer 109 and a metal barrier layer 104 that can beformed in the via 113 and on the back surface 105 of the substrate 38. Abarrier layer can first be deposited on the contact side of the GaAssubstrate. In one example, the barrier layer is a nickel vanadium (NiV)layer disposed at about 800 angstroms thickness deposited using physicalvapor deposition. The NiV layer provides an effective diffusion barrierbetween the GaAs substrate and a copper contact layer to be subsequentlyapplied, which will be applied later. Since copper is known to have anundesirable diffusion effect on GaAs, the NiV is deposited in arelatively thick layer. It will be appreciated that the thickness of thelayer may be adjusted according to the needs of the particularapplication. For example, devices subjected to long-term use may requirethicker layers, and the layer may be adjusted according to othermaterial used, for example, in the seed layer 109.

A seed layer may be deposited on the barrier layer. Although the seedlayer may not always be necessary, it has been found that a seed layerfacilitates better mechanical and electrical connection of the coppercontact layer. The metal seed layer may be, for example, either a copperlayer or a gold layer, and may be deposited at a thickness of about 700angstroms using a physical vapor deposition process. If copper is usedas the seed layer, then an activation process may need to be performedat a later time if the copper has been allowed to oxidize.

After the barrier/seed layer deposition (block 17 c), a copper layer isformed in the via and on the back surface of the substrate in block 17d. FIG. 3G shows an example of a copper layer 106 that can be formed inthe via 113 and on the back surface 105 of the substrate 38. The copperlayer 106 can replace some or all of the gold contact layer that istypically deposited in the via 113 and on the back surface 105.

One typical electroplating process involves the use of a copper sulfate(CuSO₄) bath. Typical CuSO₄ based electroplating chemistry contains asmall amount of chloride ions, a suppressor component such aspolyethylene glycol (PEG), an accelerator component such asbis(sodiumsulfopropyl) disulfide (SPS), and in most cases a nitrogenbased leveling agent such as thiourea. A competition model has beenunderstood to explain the mechanism of via fill in semiconductor circuitfabrication. According to this model, chloride is complexed with thesuppressor. Due to the long chain polymer nature of the suppressor, itis unable to diffuse rapidly into a via formed on a semiconductor wafer.The accelerator, on the other hand, is often a relatively smallmolecule, which can diffuse much more rapidly than the suppressor intothe via. As a result, the suppressor will primarily accumulate on thesurface of the semiconductor wafer, whereas the accelerator willprimarily accumulate inside the via. The higher concentration of theaccelerator increases the plating rate of copper deposition within thevia. On the surface of the wafer, however, the suppressor functions as adiffusion barrier to prevent copper ions from diffusing onto thesurface, and consequently preventing reduction of the copper ions tocopper metal. The accelerator-copper complex will gradually replace thesuppressor-chloride complex on the wafer surface, such that copper willthen be plated on the surface of the wafer, albeit at a rate slower thanthe plating inside the via. This difference in diffusion mechanismbetween the suppressor and accelerator complexes, combined with thecompetitive interaction between them, contribute to the bottom-up fillof copper metallization inside the via.

As FIG. 5 further shows, an optional heat treatment step in block 17 ecan follow the copper deposition process of block 17 d. The coppercontact layer is deposited on the seed layer, if present. The coppercontact layer is preferably deposited using an electroplating process,and is deposited at a relatively uniform thickness. Depending on thesize of the via, the copper contact layer may simply coat the walls, ormay nearly fill the via. To facilitate faster production, a 6 μm coatingof the Cu contact layer typically provides sufficient electricalconduction, while leaving a central opening in via.

Typically, the metallization process can continue for 48 hours or more.Such a long process disadvantageously extends production time GaAsintegrated circuit devices. Additionally, this slow process results incopper structure with significant defects, cracks, etc caused by theslow growth. Adding heat to the process both significantly acceleratesthe metallization process and increase the quality and uniformity of thecopper grain structure. In typical PECVD processes, the heat treatmentinvolves application of temperatures between 200 to 300° C. Thesetemperatures may exceed the melting point for the adhesive used to bondthe wafer to the carrier. Subjecting GaAs wafers mounted onto carriersto such high temperatures may therefore disadvantageously decrease thebonding strength of the carrier and wafer. Accordingly, in certainembodiments the GaAs device is subjected to a temperature ofapproximately 100° C. Once the GaAs has been subjected to heattreatment, the metallization (block 17) of via 113 is complete. In someembodiments, the metallization (block 17) of via 113 is complete withoutheat treatment.

Referring to the process 10 of FIG. 1, the GaAs wafer having a coppercontact layer 106 formed on its back side 105 can undergo a streetformation process (block 18). Such a street is described herein as beingformed from the back side of the wafer and extending through the coppercontact layer 106 to facilitate subsequent singulation of dies. It willbe understood that one or more features described herein can also beimplemented for other street-like features on or near the back surfaceof the wafer. Moreover, other street-like features can be formed forpurposes other than to facilitate the singulation process.

After etching the street into copper contact layer 106, the resist layermay be removed, using photoresist strip solvents such as NMP(N-methyl-2-pyrrolidone), applied using, for example, a batch spraytool. To remove residue of the resist material that may remain after thesolvent strip process, a plasma ash (e.g., O₂) and/or aqueous washprocess can be applied to the back side of the wafer.

Following the separate processing for the copper metallization process(block 17), copper-contact wafers may share equipment and/or processeswith gold-contact wafers for subsequent processes. Particular care canbe taken during these steps to prevent cross-contamination betweengold-contact and copper-contact wafers. Various protocols may befollowed to minimize the risk of cross-contamination during use ofshared equipment and/or processes. For example, there may becopper-designated and gold-designated vacuum wands, microscopes, gloves,cassettes, etc. In this way, even if the copper-contact and gold-contactwafers are processed in a similar machine, the vacuum wands andcassettes used to transfer the wafers between equipment can beseparately designated. By using designated tools (such as vacuum wandsand microscopes) for copper-contact wafers separate from the equipmentdesignated for gold-contact wafers, the risk of cross-contamination canbe reduced, thereby increasing overall yield. Additionally, in someembodiments, production personnel are required to wear a different colorglove when processing copper backside wafer lots. The different coloredglove further reduces the risk of processing copper backside wafer lotsthrough equipment dedicated for gold-contact.

Another potential source of cross-contamination is wafer breakage. Toavoid copper contamination of gold-contact wafers, extra care may beemployed when addressing broken copper-contact wafers within thefabrication facility. For example, following breakage of one or morecopper-contact wafers, the wafers may be quarantined, and the scraps canbe removed using copper-designated vacuum cleaners, followed by athorough wipe down of the contaminated area.

As noted above, following the metallization process (block 17), thecopper-contact and gold-contact wafers may share tooling, equipmentand/or processing. For example, both copper-contact and gold-contactwafers can use the same street formation equipment. FIG. 6 shows apartial block diagram illustrating the sub-processes of the streetformation step (block 18). To avoid cross-contamination by the sharedequipment between gold-contact and copper-contact wafers, the lots areprocessed separately. As noted above, copper-designated lots can belabeled, for example with a “COPPER” sticker so as to alert handlerswithin the fabrication facility.

In block 18 a, a street is defined via photoresist, followed by a copperetch. To form an etch resist layer that defines an etching opening,photolithography can be utilized. Coating of a resist material on theback surface of the substrate, exposure of a mask pattern, anddeveloping of the exposed resist coat can be achieved in known manners.While the photoresist and patterning portions can use shared equipmentbetween gold-contact and copper-contact wafers, the etching processwhich forms the streets often involves the use of a dedicated wet benchfor copper-contact wafers. The street can be formed through the copperusing techniques such as wet etching (with chemistry such as potassiumiodide). A pre-etching cleaning process (e.g., O₂ plasma ash) can beperformed prior to the etching process, if desired. Once the street hasbeen formed, the resist can be removed using strip solvents such as NMP(N-methyl-2-pyrrolidone) which can be applied using, for example, abatch spray tool. To remove residue of the resist material that mayremain after the solvent strip process, a plasma ash (e.g., O₂) processcan be applied to the back side of the wafer.

The process continues with flash gold coating (block 18 b) applied tothe wafer. This coating can be accomplished using shared equipment, forexample a gold physical vapor deposition machine. As noted above, copperis known to oxidize readily, thereby diminishing its desirableelectrical and mechanical properties. To protect against oxidation, alayer of gold is deposited through flash coating. In alternativeembodiments, the flash coating can include NiV. Following the flash goldcoating (block 18 b), the process 10 continues as illustrated in FIG. 4.

FIG. 7 shows a partial block diagram illustrating the debond and cleanstep (block 19). Following street formation, resist removal, and flashgold coating, the wafer no longer needs to be mounted to a carrierplate. Thus, the wafer is debonded or separated from the carrier platein block 19. In certain implementations, separation of the wafer fromthe carrier plate can be performed with the wafer below the carrierplate. Any adhesive remaining on the front side of the wafer can beremoved by a cleaning solution (e.g., acetone), and remaining residuescan be further removed by, for example, a plasma ash (e.g., O₂) process.

FIG. 8 shows a partial block diagram illustrating the post-debondingtest step (block 20). The debonded wafer of block 19 can be tested(block 20) in a number of ways prior to singulation. Such apost-debonding test can include, for example, resistance of the metalinterconnect formed on the through-wafer via using process controlparameters on the front side of the wafer. Other tests can addressquality control associated with various processes, such as quality ofthe through-wafer via etch, seed layer deposition, and metal plating.

Throughout the shared equipment and processes associated with the streetformation by copper etch (block 18 a), flash gold coating (block 18 b),debond and cleaning (block 19), and post-debonding testing (block 20),various protocols can be employed to reduce the risk ofcross-contamination between copper-contact wafers and gold-contactwafers. As noted above, one such protocol involves separating wafer lotsand labeling copper-contact lots with a clearly-marked “COPPER” sticker.The copper-contact lots can therefore be handled using separatecassettes, gloves, vacuum wands, and other tools. These steps can allowone fabrication line to share processing steps and equipment forgold-contact and copper-contact wafers, while reducing the risk ofcross-contamination between them.

Integrated Circuit Singulation and Packaging

FIG. 9A illustrates a GaAs wafer 200 with a plurality of individualintegrated circuits 201 formed in accordance with embodiments of theinvention in which copper is used as a contact metal for the vias andback-side plane. As shown in FIG. 9A, streets 202 have been formed inthe regions between each integrated circuit 201 on the wafer 200. Asdescribed above, street formation involves removing copper in theregions between the integrated circuits.

Following street formation, the wafer 200 is placed onto cutting tape203, with the backside of the GaAs wafer 200 adhering to the cuttingtape 203 and frame in the manner shown in FIGS. 9B and 9C. Next, theintegrated circuit dies are singulated by cutting through the GaAs waferalong the pre-formed streets. A scribe may be applied to the streets inorder to mechanically singulate the integrated circuit dies.Alternatively, a laser may be used to burn through the streets.Mechanical scribing is inexpensive, but typically less accurate thanlaser singulation, and may cause damage to the die. Laser singulation ismore accurate and reduces damage, but at increased expense.

Once the integrated circuit dies have been singulated, the cutting tapeis stretched apart. This stretching ensures that the dies have beensingulated, as it results in widening the separation between each of thedies. The cutting tape may be stretched until the tape is visiblebetween each of the dies. FIG. 9C illustrates stretched cutting tape inwhich some of the singulated dies have been removed. The dies may beremoved from the cutting tape manually or by automated robotics. Forexample, an automated die-picking machine may select and removeindividual dies through the use of vacuum pressure. FIG. 9D illustratesa singulated GaAs integrated circuit die, according to an embodiment ofthe present invention.

Once individual GaAs integrated circuit dies have been formed, they maybe packaged for incorporation into larger electronic devices. Varioustypes of packaging exist, some of which are described in more detailbelow. It will be understood that there exist myriad different types ofpackaging beyond those listed and described herein. Depending on thedesired application, virtually any type of packaging may be used inaccordance with the present invention. Four different packages aredescribed in more detail below: ball grid array (BGA), land grid array(LGA), molded leadframe, and quad-flat no-leads (QFN).

FIG. 10 shows an example shows an example sequence of BGA packaging ofsingulated GaAs integrated circuit dies, according to one embodiment,with FIGS. 11A-11H showing examples of structures at various stages ofthe processing sequence of FIG. 10. With reference to FIG. 11A,individual dies 201 are arranged (block 501), typically in an array,onto a laminate packaging substrate 205. A single packaging substrate205 such as that shown in FIG. 11A can include between 200 to 400 dies201, although the specific number may vary depending on the application.The packaging substrate 205 includes pre-formed lower contact pads 204on its lower surface. As described in more detail below, a grid ofsolder balls 206 are formed on the lower contact pads 204. On the topsurface the packaging substrate has die attach pads 207, onto whichsingulated dies 201 are mounted, and a plurality upper contact pads 208.The packaging substrate includes internal interconnections toelectrically connect the upper contact pads 208 on the top surface tothe lower contact pads 204 on the bottom surface.

The die attach pad 207 is typically flat and made of tin-lead, silver,or gold-plated copper. With reference to FIGS. 11B and 11C, theindividual dies 201 are attached to the die attach pads 207 (block 502)by applying solder paste to all die attach pads 207. Solder paste is anadhesive mixture of flux and tiny solder particles. The solder paste maybe deposited by the use of a screen printing process, or byjet-printing. After the solder paste has been applied, individual diesare placed onto the packaging substrate 205 by robotic pick-and-placemachines. Individual dies 201 may be removed from the cutting tape andtransferred directly to the packaging substrate, where they arepositioned to align the die attach pads with the contacts of theindividual dies. The solder paste connects the die attach pads 207 tothe contacts of the individual dies 201. To provide a more robustconnection, the dies are subjected to heat treatment for solder reflow.The precise temperatures and times for this process will vary dependingon the composition of the solder paste. Typical temperatures range from100° to 260° C., with dwell times at peak temperatures ranging from 50seconds to two minutes. This heat treatment causes the solder particleswithin the solder paste to melt. The solder is then allowed to cool,resulting in a robust electrical and mechanical connection between thepackaging substrate and the individual dies.

With reference to FIG. 11D, following attachment of the individual dies201 to the packaging substrate 205, electrical interconnection is formedbetween bonding pads on the integrated circuit and the upper contactpads 208 on the top surface of the packaging substrate 205 (block 503).This connection may be formed by wire bonding or flip-chip methods. Wirebonding involves arranging wires 209, often made of copper, gold, oraluminum, between an upper contact pad 208 at one end, and a bonding padon the integrated circuit die 201 at the other. The wire 209 is attachedusing some combination of heat, pressure, and ultrasonic energy to weldthe wire 209 in place. Flip chip interconnection involves applyingsolder bumps to the bonding pads on the top surface of the integratedcircuit. The integrated circuit is then inverted, and arranged such thatthe solder bumps align with contact pads. With the application of heat,the solder bumps melt and, following a cooling process, an electricaland mechanical connection may be formed between the bonding pads on theintegrated circuit die and the contact pads on the packaging substrate.

With reference to FIG. 11E, after electrical interconnection has beenformed between the die and the packaging substrate, the entire packagingsubstrate is covered with a molding compound 210 (block 504). There area wide variety of commercially available molding compounds. Typically,these are epoxy-based compounds. The packaging substrate 205 coveredwith the molding compound 210 is then cured in an oven. The temperatureand duration of curing depends on the particular molding compoundselected. As shown in FIG. 11F, after the molding compound 210 hascured, the each die 201 on the packaging substrate 210 is totallyencapsulated, including the electrical interconnections 209, with onlythe bottom surface of the packaging substrate 205, with its lowercontact pads, exposed. At this stage, the packaging substrate 205covered with cured molding compound 210 can be sawed (block 505),thereby singulating the packaged devices. Singulation may be performedmechanically, such as with a wafer saw.

Each packaged device is inverted at this stage, and then on top of eachlower contact pad 204 on the packaging substrate, a small ball of solderpaste is deposited, creating a grid of solder paste balls 206 (block506). The BGA package may then be placed over solder pads on a PCB, witheach solder paste ball 206 aligned to a solder pad. The solder pads areflat, and typically made of tin-lead, silver, or gold-plated copper.FIG. 11E illustrates a schematic cross-section of a singulated BGApackaged die, with FIGS. 11G and 11 illustrating the top and bottomperspective views of the same.

Mounted Integrated Circuit Device

FIG. 12 illustrates one embodiment of a GaAs integrated circuit device200. The device 200 generally comprises a printed circuit board 212connected to a GaAs integrated circuit 211. The GaAs integrated circuit211 has a backside 105 and a frontside 103. The GaAs integrated circuit211 includes a GaAs substrate 38, a barrier layer 104, a protectivelayer 108, and a copper contact layer 106. In some embodiments, the GaAsintegrated circuit 211 may also include a seed layer 109 between thecopper contact layer 106 and the barrier 104. The seed layer 109 mayserve to facilitate mechanical and electrical connection to the coppercontact layer 106, but is not always necessary. The printed circuitboard includes a pad which is adapted to couple with the GaAs integratedcircuit 211 at the backside 105. The GaAs integrated circuit 211 isconfigured to be mounted on the printed circuit board 212 by the pad216. In one embodiment, the GaAs integrated circuit 211 is mounted tothe pad 216 by a layer of solder 218 interposed between the backside 105and the pad 216.

The barrier layer 104 is formed on the lower surface 105 of the GaAssubstrate 38 and serves to isolate the copper contact layer 106 from theGaAs substrate 38 to prevent copper diffusion. The copper contact layer106 is formed on the backside 105 of the GaAs integrated circuit 211.The copper contact layer 106 provides an electrical ground contactbetween the GaAs substrate 38 and the pad 216 on the printed circuitboard 212. In one embodiment, the layer of solder 218 is formed betweenthe copper contact layer 106 and the pad 216 to securely mechanicallyattach the backside 105 of the GaAs integrated circuit 211 to theprinted circuit board 212. In one embodiment, the protective layer 108is formed between the copper contact layer 106 and the solder 218 toprevent oxidation of the copper. The GaAs substrate 38 comprises aplurality of vias 25 which have been etched through the GaAs substrate38 to form electrical connections between various integrated circuitsdisposed thereon. The vias 25 have sidewalls which will comprise thelayers previously deposited on the GaAs substrate, as described in moredetail above.

FIG. 13 illustrates a portion of an electronic device incorporating aGaAs integrated circuit device made according to various methods of thepresent invention. In some embodiments, the device can be a portablewireless device, such as a cellular phone. The device can include abattery configured to supply power to the device, a circuit boardconfigured to provide support for and to interconnect various electroniccomponents, and an antenna configured to receive and transmit wirelesssignals. The electronic device can include a number of additionalcomponents, such as a display processor, central processor, userinterface processor, memory, etc. In other embodiments, the electronicdevice may be a component of a tablet computer, PDA, or other wirelessdevice.

Terminology

Unless the context clearly requires otherwise, throughout thedescription and the claims, the words “comprise,” “comprising,” and thelike are to be construed in an inclusive sense, as opposed to anexclusive or exhaustive sense; that is to say, in the sense of“including, but not limited to.” The word “coupled”, as generally usedherein, refers to two or more elements that may be either directlyconnected, or connected by way of one or more intermediate elements.Additionally, the words “herein,” “above,” “below,” and words of similarimport, when used in this application, shall refer to this applicationas a whole and not to any particular portions of this application. Wherethe context permits, words in the above Detailed Description using thesingular or plural number may also include the plural or singular numberrespectively. The word “or” in reference to a list of two or more items,that word covers all of the following interpretations of the word: anyof the items in the list, all of the items in the list, and anycombination of the items in the list.

The above detailed description of embodiments of the invention is notintended to be exhaustive or to limit the invention to the precise formdisclosed above. While specific embodiments of, and examples for, theinvention are described above for illustrative purposes, variousequivalent modifications are possible within the scope of the invention,as those skilled in the relevant art will recognize. For example, whileprocesses or blocks are presented in a given order, alternativeembodiments may perform routines having steps, or employ systems havingblocks, in a different order, and some processes or blocks may bedeleted, moved, added, subdivided, combined, and/or modified. Each ofthese processes or blocks may be implemented in a variety of differentways. Also, while processes or blocks are at times shown as beingperformed in series, these processes or blocks may instead be performedin parallel, or may be performed at different times.

The teachings of the invention provided herein can be applied to othersystems, not necessarily the system described above. The elements andacts of the various embodiments described above can be combined toprovide further embodiments.

While certain embodiments of the inventions have been described, theseembodiments have been presented by way of example only, and are notintended to limit the scope of the disclosure. Indeed, the novel methodsand systems described herein may be embodied in a variety of otherforms; furthermore, various omissions, substitutions and changes in theform of the methods and systems described herein may be made withoutdeparting from the spirit of the disclosure. The accompanying claims andtheir equivalents are intended to cover such forms or modifications aswould fall within the scope and spirit of the disclosure.

1. A method of reducing cross contamination during the manufacture ofcopper-contact and gold-contact GaAs wafers using shared equipment, themethod comprising: marking copper-contact wafers using a first marker;marking gold-contact wafers using a second marker; preparing thegold-contact wafers and the copper-contact wafers for respective goldand copper plating using the same equipment; performing copper platingof the copper-contact wafers using a first piece of equipment solelydedicated to copper plating; performing gold plating of the gold-contactwafers using a second piece of equipment different from the first pieceof equipment; and following the respective copper plating and goldplating, preparing a plurality of integrated circuits using the sameequipment and incorporating at least one of the gold-contact wafers andthe copper-contact wafers.
 2. The method of claim 1 wherein thepreparing includes street formation, flash gold coating, debonding,cleaning, singulation, and recast etching of the copper-contact wafersand the gold-contact wafers.
 3. The method of claim 1 further includingfitting personnel with colored gloves based on whether the personnel arehandling the gold-contact wafers or the copper-contact wafers.
 4. Themethod of claim 1 wherein the performing copper plating includespre-cleaning the copper-contact wafers, depositing a barrier and/or seedlayer onto the copper-contact wafers, copper plating the copper-contactwafers, and heat treating the copper-contact wafers after the copperplating.
 5. The method of claim 1 wherein the first piece of equipmentincludes first vacuum wands, first microscopes, first gloves, and firstcassettes for the copper-contact wafers.
 6. The method of claim 5wherein the second piece of equipment includes second vacuum wands,second microscopes, second gloves, and second cassettes for thegold-contact wafers.
 7. The method of claim 1 wherein the first markeris a tag with desired lettering.
 8. The method of claim 7 wherein thedesired lettering includes the word copper in a native language ofproduction personnel.
 9. A method of reducing cross contamination duringthe manufacture of copper-contact and gold-contact GaAs wafers usingshared equipment, the method comprising: marking copper-contact wafersusing a first marker; preparing the gold-contact wafers and thecopper-contact wafers for respective gold and copper plating using thesame equipment; performing copper plating of the copper-contact wafersusing a first piece of equipment solely dedicated to copper plating;performing gold plating of the gold-contact wafers using a second pieceof equipment different from the first piece of equipment; and followingthe respective copper plating and gold plating, preparing a plurality ofintegrated circuits using the same equipment and incorporating at leastone of the gold-contact wafers and the copper-contact wafers.
 10. Themethod of claim 9 wherein the preparing includes street formation, flashgold coating, debonding, cleaning, singulation, and recast etching ofthe copper-contact wafers and the gold-contact wafers.
 11. The method ofclaim 9 further including fitting personnel with colored gloves based onwhether the personnel are handling the gold-contact wafers or thecopper-contact wafers.
 12. The method of claim 9 wherein the performingcopper plating includes pre-cleaning the copper-contact wafers,depositing a barrier and/or seed layer onto the copper-contact wafers,copper plating the copper-contact wafers, and heat treating thecopper-contact wafers after the copper plating.
 13. The method of claim9 wherein the first piece of equipment includes first vacuum wands,first microscopes, first gloves, and first cassettes for thecopper-contact wafers.
 14. The method of claim 13 wherein the secondpiece of equipment includes second vacuum wands, second microscopes,second gloves, and second cassettes for the gold-contact wafers.
 15. Themethod of claim 9 wherein the first marker is a tag with desiredlettering.
 16. The method of claim 15 wherein the desired letteringincludes the word copper in a native language of production personnel.17. A method of reducing cross contamination during the manufacture ofcopper-contact and gold-contact GaAs wafers using shared equipment, themethod comprising: marking copper-contact wafers using a first marker;marking gold-contact wafers using a second marker; preparing thegold-contact wafers and the copper-contact wafers for respective goldand copper plating using the same equipment; performing copper platingof the copper-contact wafers using a first piece of equipment solelydedicated to copper plating; and performing gold plating of thegold-contact wafers using a second piece of equipment different from thefirst piece of equipment.
 18. The method of claim 17 wherein thepreparing includes street formation, flash gold coating, debonding,cleaning, singulation, and recast etching of the copper-contact wafersand the gold-contact wafers.
 19. The method of claim 17 furtherincluding fitting personnel with colored gloves based on whether thepersonnel are handling the gold-contact wafers or the copper-contactwafers.
 20. The method of claim 17 wherein the performing copper platingincludes pre-cleaning the copper-contact wafers, depositing a barrierand/or seed layer onto the copper-contact wafers, copper plating thecopper-contact wafers, and heat treating the copper-contact wafers afterthe copper plating.